Fifteenth International Conference on Nanoimprint and Nanoprint Technology

 

Committees

 

International Steering Committee

  • Stephen Y. Chou (Princeton Univ., USA)
  • Shinji Matsui (Hyogo Univ., Korea)
  • Lars Montelius (Lund Univ., Sweden)
  • Eung Sug Lee (Korea Institute of Machinery & Materials, Korea)
  • Heon Lee (Korea Univ., Korea)

International Program Committee

- JAPAN

  • Kouji Asakawa (Toshiba Corporation, Japan)
  • Yoshihiko Hirai (Osaka Perfect Univ., Japan)
  • Hiroshi Hiroshima (AIST, Japan)
  • Shinji Matsui (Hyogo Univ., Japan)
  • Ryutaro Maeda (AIST, Japan)
  • Akihiro Miyauchi (Hitachi, Japan)
  • Masaru Nakagawa (Tohoku Univ., Japan)
  • Mashaharu Takahashi (AIST, Japan)
  • Atsushi Yokoo (NTT, Japan)

- Europe

  • Jouni Ahopelto (VTT Helsinki, Finland)
  • Brian Bilenberg (NIL Technology Aps Copenhagen, Denmark)
  • Yong Chen (Ecole Normale Supérieure Paris, France)
  • Graham Cross (Trinity College Dublin, Irland )
  • Lothar Frey (Fraunhofer-Institute for Integrated Systems and device Technology, Germany)
  • Michael Hornung (SUSS Microtec Lithography GmbH, Germany)
  • Anders Kristensen (Technical Univ. of Denmark, Denmark)
  • Heinrich Kurz (AMO GmbH Aachen, Germany)
  • Lars Montelius (Lund University, Sweden)
  • Michael Mühlberger (Profactor GmbH Steyr, Austria)
  • Helmut Schift (Paul Scherrer Institut Villigen, Switzerland)
  • Hella-Christine Scheer (Bergische Univ. Wuppertal, Germany)
  • Clivia M Sotomayor Torres (Catalan Institute of Nanotechnology Barcelona, Spain)

- USA & Canada

  • Alexei Boganov (Canadian Photonic Fabrication Centre, Canada)
  • Stephen Y Chou (University of Priceton, USA)
  • Roger Fabian (Pease University of Stanford, USA)
  • Jay Guo (University of Michigan, USA)
  • Cynthia Hanson (SAPWAR Pacific San Diego, USA)
  • William P. King (Univ. of Illinois Urbana-champaign Illunois, USA)
  • Xiaogan Liang (The Molecular Foundary, Lawrence Berkeley National Lab., USA)
  • James Alexander Liddle (NIST gaitherburg, USA)
  • Douglas J Resnick (Molecular Imprints Inc., USA)
  • Christophe Peroz (Abeam Technologies Berkeley, USA)
  • Chris Soles (NIST gaitherburg, USA)
  • Grant Wilson (University of Texas at Austin, USA)
  • Wei Wu (Wei Wu HP labs, USA)

- ASIA

  • Fuh-Yu Chang (National Taiwan University of Science and Technology, Taiwan)
  • Haixiong Ge (Nanjing Univ. China)
  • Zhongfan Liu (Peking Univ., China)
  • Nan Lu (Jilin Univ. Changchun, China)
  • LOW Hong Wee (Institute of Materials Research and Engineering, Singapore)

 

Program Committee (Chair : Eung Sug Lee / KIMM)

Application Ⅰ: Electronics/Magnetics, Optoelectronics/Optics and Photovoltaics

  • Chair : Shinill Kang (Yonsei Univ., Korea)
  • Co-chair : Yoshihiko Hirai (Osaka Pref. Univ. Japan)
  • Member :
    - Inkyu Park (KAIST, Korea)
    - Byung Kyu Lee (Samsung Electronics, Korea)

Application Ⅱ: Biology/u-TAS, Biomimetics, Self-assembly, Chemistry

  • Chair : Kahp-Yang Suh (Seoul National Univ., Korea)
  • Co-chair : Akihiro Miyauchi (Hitachi, Japan)
  • Member :
    - Dong Sung Kim (POSTECH, Korea)
    - Myung Mo Sung (Hanyang Univ., Korea)

Material Issues

  • Chair : Dahl-Young Khang (Yonsei Univ., Korea)
  • Co-Chair : Masaru Nakagawa (Tohoku Univ., Japan)
  • Member :
    - Jun-Ho Jeong (KIMM, Korea)
    - Patrick Y. Shim (LMS, Korea)
    - Youn Sang Kim (Seoul National Univ., Korea)

Metrology, Standards and Reliability

  • Chair : Dae-Geun Choi (KIMM, Korea)
  • Co-chair : Hiroshi Hiroshima (AIST, Japan)
  • Member :
    - Si Youl Jang (Kookmin Univ., Korea)
    - Maenghyo Cho (Seoul National Univ., Korea)

Process and Modeling

  • Chair : Myung-Yung Jeong (Pusan National Univ. Korea)
  • Co-chair :
    - Shinji Matsui (Hyogo University, Japan)
    - Hella-Christine Scheer (Bergische Univ. Wuppertal, Germany)  
  • Member :
    - Heon Lee (Korea Univ. Korea)
    - Gun-Young Jung (GIST, Korea)

Roll to Roll

  • Chair : Nak Kyu Lee (Korea Institute of Industrial Technology, Korea)
  • Co-chair : Fuh-Yu Chang (National Taiwan University of Science and Technology, Taiwan)
  • Member :
    - Jeongdai Jo (KIMM, Korea)

Stamp, Templates and Equipment

  • Chair : Jae Jong Lee ( Korea Institute of Machinery & Materials, Korea)
  • Co-chair : Helmut Schift (Paul Scherrer Institut Villigen, Switzerland)
  • Member :
    - Ho-Duck Rhee (Genesem Inc., Korea)
    - Atsushi YoKoo (NTT Basic research lab., Japan)

On-line Registration